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Plasma synthesis of metallic and composite thin films with atomically mixed substrate bonding

โœ Scribed by I.G. Brown; A. Anders; S. Anders; M.R. Dickinson; I.C. Ivanov; R.A. MacGill; X.Y. Yao; K.-M. Yu


Book ID
113283590
Publisher
Elsevier Science
Year
1993
Tongue
English
Weight
427 KB
Volume
80-81
Category
Article
ISSN
0168-583X

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## Nitrogenated amorphous carbon films (a-CN V ) were prepared by reactive magnetron sputtering at room temperature with different substrate bias voltage (ยป ) and N concentration in the plasma. In situ spectroscopic ellipsometry (SE) data analysis was used to monitor the composition and the film t