๐”– Bobbio Scriptorium
โœฆ   LIBER   โœฆ

Plasma sterilization using the RF glow discharge

โœ Scribed by Liqing Yang; Jierong Chen; Junling Gao; Yafei Guo

Publisher
Elsevier Science
Year
2009
Tongue
English
Weight
693 KB
Volume
255
Category
Article
ISSN
0169-4332

No coin nor oath required. For personal study only.

๐Ÿ“œ SIMILAR VOLUMES

Simulation and Model Reduction Methods f
Simulation and Model Reduction Methods for an RF Plasma Glow Discharge
โœ Yi-hung Lin; Raymond A Adomaitis ๐Ÿ“‚ Article ๐Ÿ“… 2001 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 183 KB

In this paper, we report on numerical solutions and model reduction results for a plasma glow discharge model with a radio frequency ionization source. A pseudospectral implementation of a global spectral method was found to give accurate simulation results that correctly reflected the expected phys

High-photosensitivity a-SiGe: H films pr
High-photosensitivity a-SiGe: H films prepared by RF glow discharge plasma CVD method
โœ Fangqing Zhang; Zhizhong Song; Yongping Guo; Guanghua Chen ๐Ÿ“‚ Article ๐Ÿ“… 1993 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 247 KB

Highly photosensitive and narrow band gap a-SiGe:H films have been prepared by the RF glow discharge plasma CVD method. The photosensitivity was 2.01 ร— 10 s for the film with an optical band gap of Eg = 1.47 eV. H 2 dilution and a relatively high RF power are attributed to the improving of the optoe