๐”– Bobbio Scriptorium
โœฆ   LIBER   โœฆ

Plasma polymerization of trimethylsilane in cascade arc discharge

โœ Scribed by Y.-S. Lin; H. K. Yasuda


Publisher
John Wiley and Sons
Year
1997
Tongue
English
Weight
394 KB
Volume
66
Category
Article
ISSN
0021-8995

No coin nor oath required. For personal study only.

โœฆ Synopsis


Plasma polymerization of trimethylsilane (TMS) in cascade arc discharge was experimentally investigated. It was found that the deposition rates of methane and TMS plasma polymer were dependent on plasma parameters, and the surface characteristics of plasma polymer were also dependent on plasma variables. The following plasma variables were studied: arc current, argon flow rate, TMS flow rate, chamber pressure, substrate axial, and radial positions. Carbon, silicon, and oxygen were the main elements observed in TMS polymer films obtained by x-ray photoelectron spectroscopy (XPS). Powder-like TMS polymer films were observed by scanning electron microscopy (SEM). The size distribution of the powder-like particles was strongly dependent on deposition parameters.


๐Ÿ“œ SIMILAR VOLUMES


Internal stress in plasma polymer films
โœ Q. S. Yu; H. K. Yasuda ๐Ÿ“‚ Article ๐Ÿ“… 1999 ๐Ÿ› John Wiley and Sons ๐ŸŒ English โš– 229 KB

Thin plasma polymer films were deposited from several liquid monomers (mainly siloxane-type monomers) in a low-temperature cascade arc torch (CAT) reactor. The effects of monomer structures and plasma parameters on internal stress in the films were experimentally studied. By appropriately adjusting

Optical emission diagnostics in cascade
โœ Q. S. Yu; E. Krentsel; H. K. Yasuda ๐Ÿ“‚ Article ๐Ÿ“… 1998 ๐Ÿ› John Wiley and Sons ๐ŸŒ English โš– 212 KB ๐Ÿ‘ 2 views

Optical Emission Spectroscopy (OES) was used to identify reactive species and their excitation states in low-temperature cascade arc plasmas of N 2 , CF 4 , C 2 F 4 , CH 4 , and CH 3 OH. In a cascade arc plasma, the plasma gas (argon or helium) was excited in the cascade arc generator and injected i

Deposition behavior in a low-temperature
โœ Q. S. Yu; H. K. Yasuda ๐Ÿ“‚ Article ๐Ÿ“… 1999 ๐Ÿ› John Wiley and Sons ๐ŸŒ English โš– 291 KB

Two kinds of hydrocarbon type monomers and three kinds of organosilicons were polymerized by a low-temperature cascade arc argon plasma torch. Their deposition behaviors were studied as a function of experimental parameters and monomer elemental compositions. It was found that the normalized deposit