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Plasma-parameter dependence of thin-oxide damage from wafer charging during electron-cyclotron-resonance plasma processing

โœ Scribed by Friedmann, J.B.; Shohet, J.L.; Mau, R.; Hershkowitz, N.; Bisgaard, S.; Shawming Ma, ; McVittie, J.P.

Book ID
121341000
Publisher
IEEE
Year
1997
Tongue
English
Weight
574 KB
Volume
10
Category
Article
ISSN
0894-6507

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