๐”– Bobbio Scriptorium
โœฆ   LIBER   โœฆ

Plasma immersion ion implantation (PI3) and r.f. plasma nitriding of a microalloyed steel

โœ Scribed by F. Mahboubi; M. Samandi; D. Dunne


Publisher
Elsevier Science
Year
1996
Tongue
English
Weight
903 KB
Volume
85
Category
Article
ISSN
0257-8972

No coin nor oath required. For personal study only.


๐Ÿ“œ SIMILAR VOLUMES


Plasma nitriding of microalloyed steel
โœ F. Mahboubi; M. Samandi; D. Dunne; A. Bloyce; T. Bell ๐Ÿ“‚ Article ๐Ÿ“… 1995 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 609 KB
Plasma immersion ion implantation of Peb
โœ A. Kondyurin; P. Volodin; J. Weber ๐Ÿ“‚ Article ๐Ÿ“… 2006 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 465 KB

Nitrogen plasma immersion ion implantation (PIII) was applied to Pebax thin films and plates using doses ranging from 5 โ€ข 10 14 to 10 17 ions/cm 2 at applied voltages of 5, 10, 20 and 30 kV. The analysis of the Pebax structure after implantation was performed using FTIR ATR, Raman, UV-vis transmissi

Argon plasma immersion ion implantation
โœ A. Kondyurin; B.K. Gan; M.M.M. Bilek; D.R. McKenzie; K. Mizuno; R. Wuhrer ๐Ÿ“‚ Article ๐Ÿ“… 2008 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 843 KB

Plasma immersion ion implantation (PIII), using bias voltages of 5, 10, 15 and 20 kV in an argon plasma and fluences in the range of 2 ร‚ 10 14 -2 ร‚ 10 16 ions/cm 2 , was applied to 100 nm polystyrene films coated on silicon wafer substrates. The etching kinetics and structural changes induced in the