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Plasma-enhanced Chemical Vapor Deposition of Aluminum Oxide Using Ultrashort Precursor Injection Pulses

✍ Scribed by G. Dingemans; M. C. M. van de Sanden; W. M. M. Kessels

Book ID
112177975
Publisher
John Wiley and Sons
Year
2012
Tongue
English
Weight
931 KB
Volume
9
Category
Article
ISSN
1612-8850

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Pulsed plasma-enhanced chemical vapor deposition from hexafluoropropylene oxide: Film composition study
✍ Scott J. Limb; David J. Edell; Edward F. Gleason; Karen K. Gleason πŸ“‚ Article πŸ“… 1998 πŸ› John Wiley and Sons 🌐 English βš– 296 KB πŸ‘ 1 views

Films deposited using pulsed plasma-enhanced chemical vapor deposition (PECVD) from hexafluoropropylene oxide (HFPO) were investigated by X-ray photoelectron spectroscopy (XPS). As compared to continuous rf PECVD, pulsed excitation increases the CF 2 fraction in the film. Film composition was determ