Plasma-Enhanced Atomic Layer Deposition of Tantalum Nitrides Using Hydrogen Radicals as a Reducing Agent

✍ Scribed by Park, Jin-Seong; Lee, Min-Jung; Lee, Choon-Soo; Kang, Sang-Won

• Book ID: 121400096
• Publisher: The Electrochemical Society
• Year: 2001
• Tongue: English
• Weight: 157 KB
• Volume: 4
• Category: Article
• ISSN: 1099-0062
• DOI: 10.1149/1.1353160