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Plasma dynamics of optical breakdown during deep melting of metals

โœ Scribed by R. V. Arutyunyan; L. A. Bol'shov; M. F. Kanevskii; K. A. Krivoruchko; V. P. Reshetin; R. I. Soloukhin


Publisher
SP MAIK Nauka/Interperiodica
Year
1989
Tongue
English
Weight
484 KB
Volume
29
Category
Article
ISSN
0021-8944

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Deep-level transient spectroscopy charac
โœ O. Joubert; D. Mathiot; J. Pelletier ๐Ÿ“‚ Article ๐Ÿ“… 1989 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 376 KB

It is shown that plasma stripping of a photosensitive resist induces metallic contamination of the underlying substrate. It is" possible to discriminate between the contamination induced by the reactor environment attd the contamination due to the resist itself In particular it is" demonstrated that