Deep-level transient spectroscopy charac
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O. Joubert; D. Mathiot; J. Pelletier
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Article
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1989
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Elsevier Science
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English
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It is shown that plasma stripping of a photosensitive resist induces metallic contamination of the underlying substrate. It is" possible to discriminate between the contamination induced by the reactor environment attd the contamination due to the resist itself In particular it is" demonstrated that