Preparation of Boron–Silicon Thin Film b
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Masatoshi Takeda; Masahiro Ichimura; Hideshi Yamaguchi; Yoshiko Sakairi; Kaoru K
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Article
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2000
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Elsevier Science
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English
⚖ 133 KB
Boron+silicon amorphous 5lms were prepared by pulsed laser deposition technique. Band gap was estimated from the optical absorption spectrum for the 5lms, and it increased with increasing silicon concentration. The values and concentration dependence of the band gap are nearly the same as those meas