Plasma and deposition enhancement by modified arc evaporation source
β Scribed by P. Sathrum; B.F. Coll
- Publisher
- Elsevier Science
- Year
- 1992
- Tongue
- English
- Weight
- 581 KB
- Volume
- 50
- Category
- Article
- ISSN
- 0257-8972
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π SIMILAR VOLUMES
During the deposition of hard titaniumnitrid films the plasma conditions mere investigated with s movable Langmuir-probe in axial and radial directions systematically. The deposition took place in a hollow cathode arc evaporation equipment (HCAE). We measured the electron energy distribution functio
## Abstract Direct current (dc) arc plasma with continuous aerosol supply was coupled with an external oscillatingmagnetic field of a few tens of mT and a frequency of up to 1 kHz. Such configuration was used to alter the plasmaβrelated radiative properties. The magnetic field was oriented perpendi