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Planar InSb photodiodes fabricated by Be and Mg ion implantation

✍ Scribed by C.E. Hurwitz; J.P. Donnelly


Book ID
107856175
Publisher
Elsevier Science
Year
1975
Tongue
English
Weight
395 KB
Volume
18
Category
Article
ISSN
0038-1101

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Be- and Mg-ion implantation-induced dama
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The electronic characteristics of narrow-gap III-V semiconductor InSb make this material play an important role in infrared detectors. In this material, p-n junctions are currently achieved by light Be-ion implantation to reduce the implantation-induced damage. But the hazardous character of berylli