Pixel-based simultaneous source and mask optimization for resolution enhancement in optical lithography

✍ Scribed by Ma, Xu; Arce, Gonzalo R.

• Book ID: 115410910
• Publisher: Optical Society of America
• Year: 2009
• Tongue: English
• Weight: 227 KB
• Volume: 17
• Category: Article
• ISSN: 1094-4087
• DOI: 10.1364/OE.17.005783