Binary mask optimization for forward lithography based on the boundary layer model in coherent systems

✍ Scribed by Ma, Xu; Arce, Gonzalo R.

• Book ID: 115391591
• Publisher: Optical Society of America
• Year: 2009
• Tongue: English
• Weight: 277 KB
• Volume: 26
• Category: Article
• ISSN: 1084-7529
• DOI: 10.1364/JOSAA.26.001687