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Physicochemical characterization by means of IR absorption spectroscopy of Si3N4 thin films obtained by chemical vapour deposition assisted by in situ electrical disharge

โœ Scribed by B. Balland; J.C. Bureau; R. Botton; A. Glachant; M. Lemiti


Publisher
Elsevier Science
Year
1993
Tongue
English
Weight
305 KB
Volume
20
Category
Article
ISSN
0921-5107

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