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FT-IR, SIMS and electrical characterization of Si3N4 thin films obtained from CVD, assisted by in situ electrical discharge

✍ Scribed by B. Balland; R. Botton; M. Lemiti; J.C. Bureau; A. Glachant


Publisher
Elsevier Science
Year
1993
Tongue
English
Weight
342 KB
Volume
24
Category
Article
ISSN
0026-2692

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