Photothermal reflectance investigation of processed silicon. I. Room-temperature study of the induced damage and of the annealing kinetics of defects in ion-implanted wafers

✍ Scribed by Christofides, Constantinos; Vitkin, I. Alex; Mandelis, Andreas

• Book ID: 125501752
• Publisher: American Institute of Physics
• Year: 1990
• Tongue: English
• Weight: 992 KB
• Volume: 67
• Category: Article
• ISSN: 0021-8979
• DOI: 10.1063/1.345449