Photosensitive Polyimide/Silica Hybrids
✍ Scribed by Z.-K. Zhu; J. Yin; F. Cao; X. Shang; Q. Lu
- Publisher
- John Wiley and Sons
- Year
- 2000
- Tongue
- English
- Weight
- 266 KB
- Volume
- 12
- Category
- Article
- ISSN
- 0935-9648
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This article describes the preparation of a kind of auto-photosensitive polyimide (PSPI) that contains organo-silicone moiety in its main chain. A group of novel auto-photosensitive polyimides were prepared based on the aromatic diamine monomers and 3,3Ј,5,5Ј-benzophenontetracarboxylic dianhydride (