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Modification of negative auto-photosensitive polyimide

โœ Scribed by Jia-Shen Li; Zuo-Bang Li; Pu-Kun Zhu


Publisher
John Wiley and Sons
Year
2000
Tongue
English
Weight
121 KB
Volume
77
Category
Article
ISSN
0021-8995

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โœฆ Synopsis


This article describes the preparation of a kind of auto-photosensitive polyimide (PSPI) that contains organo-silicone moiety in its main chain. A group of novel auto-photosensitive polyimides were prepared based on the aromatic diamine monomers and 3,3ะˆ,5,5ะˆ-benzophenontetracarboxylic dianhydride (BTDA) by the method of solution polycondensation at room temperature and imidized at a high temperature. The properties of PSPIs, such as ultraviolet (UV) absorption, electric and adhesion properties, and moisture absorption, were characterized by UV analysis, a dielectric constant detector, and so on. The relationship between the structure and properties of PSPIs is discussed.


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