Modification of negative auto-photosensitive polyimide
โ Scribed by Jia-Shen Li; Zuo-Bang Li; Pu-Kun Zhu
- Publisher
- John Wiley and Sons
- Year
- 2000
- Tongue
- English
- Weight
- 121 KB
- Volume
- 77
- Category
- Article
- ISSN
- 0021-8995
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โฆ Synopsis
This article describes the preparation of a kind of auto-photosensitive polyimide (PSPI) that contains organo-silicone moiety in its main chain. A group of novel auto-photosensitive polyimides were prepared based on the aromatic diamine monomers and 3,3ะ,5,5ะ-benzophenontetracarboxylic dianhydride (BTDA) by the method of solution polycondensation at room temperature and imidized at a high temperature. The properties of PSPIs, such as ultraviolet (UV) absorption, electric and adhesion properties, and moisture absorption, were characterized by UV analysis, a dielectric constant detector, and so on. The relationship between the structure and properties of PSPIs is discussed.
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