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Photorefractive properties for holographic application of Ce:Fe:LiNbO3 crystals with various [Li]/[Nb] ratios

✍ Scribed by Zhaopeng Xu; Jie Gong; Shiwen Xu; Yuheng Xu

Book ID
113915705
Publisher
Elsevier Science
Year
2012
Tongue
English
Weight
773 KB
Volume
152
Category
Article
ISSN
0038-1098

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Optical damage resistance of Hf:Fe:LiNbO
Optical damage resistance of Hf:Fe:LiNbO3 crystals with various [Li]/[Nb] ratios
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## Abstract Hf:Fe:LiNbO~3~ crystals were grown in air by the Czochralski technique with various [Li]/[Nb] ratios ([Li]/[Nb]=0.94, 1.05, 1.20) in melt. The defect structure and location of doped ions were analyzed by the UV‐visible absorption spectra. The optical damage resistance of Hf:Fe:LiNbO~3~