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Optical damage resistance of Hf:Fe:LiNbO3 crystals with various [Li]/[Nb] ratios

✍ Scribed by Hongxin Shi; Changyu Ren; Suhua Luo; Qingxin Meng; Xiudong Sun

Publisher: John Wiley and Sons
Year: 2011
Tongue: English
Weight: 137 KB
Volume: 46
Category: Article
ISSN: 0232-1300
DOI: 10.1002/crat.201000305

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✦ Synopsis

Abstract

Hf:Fe:LiNbO~3~ crystals were grown in air by the Czochralski technique with various [Li]/[Nb] ratios ([Li]/[Nb]=0.94, 1.05, 1.20) in melt. The defect structure and location of doped ions were analyzed by the UV‐visible absorption spectra. The optical damage resistance of Hf:Fe:LiNbO~3~ crystals was investigated by the photoinduced birefringence change and the transmitted light spot distortion method. The results show that the optical damage resistance ability of Hf:Fe:LiNbO~3~ crystals decreases with the increase of the [Li]/[Nb] ratio. The dependence of the optical damage resistance of Hf:Fe:LiNbO~3~ crystals on the defect structure is discussed in detail. (© 2011 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)

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