Defect structure and optical damage resistance of Hf:Fe:LiNbO3 crystals with various [Li]/[Nb] ratios

✍ Scribed by Xiudong Sun; Hongxin Shi; Suhua Luo; Yongyuan Jiang; Qingxin Meng

• Publisher: John Wiley and Sons
• Year: 2010
• Tongue: English
• Weight: 138 KB
• Volume: 45
• Category: Article
• ISSN: 0232-1300
• DOI: 10.1002/crat.200900620

✦ Synopsis

Abstract

Hf:Fe:LiNbO~3~ crystals were grown in air by the Czochralski technique with various ratios of [Li]/[Nb]=0.94, 1.05, 1.20 in melt. The defect structure and location of doped ions were analyzed by the UV‐visible and infrared spectroscopy. The optical damage resistance ability of Hf:Fe:LiNbO~3~ crystals was measured by the photo‐induced birefringence change and the transmitted light spot distortion method. The results show that the optical damage resistance ability of Hf:Fe:LiNbO~3~ crystals is enhanced with the increase of the [Li]/[Nb] ratio. The dependence of the optical damage resistance of Hf:Fe:LiNbO~3~ crystals on the defect structure is discussed in detail. (© 2010 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)