๐”– Bobbio Scriptorium
โœฆ   LIBER   โœฆ

Photopolymerization of methyl methacrylate and styrene by a oxosulfonium ylide

โœ Scribed by Kondo, Shuji ;Muramatsu, Masataka ;Senga, Minoru ;Tsuda, Kazuichi


Book ID
105335196
Publisher
John Wiley and Sons
Year
1984
Weight
167 KB
Volume
22
Category
Article
ISSN
0360-6376

No coin nor oath required. For personal study only.


๐Ÿ“œ SIMILAR VOLUMES


Photopolymerization of styrene, p-chloro
โœ H. B. Chen; T. C. Chang; Y. S. Chiu; S. Y. Ho ๐Ÿ“‚ Article ๐Ÿ“… 1996 ๐Ÿ› John Wiley and Sons ๐ŸŒ English โš– 464 KB ๐Ÿ‘ 1 views

The rates of photochemical polymerization of styrene (St), p-chlorostyrene (Cl-St), methyl methacrylate (MMA), and butyl methacrylate (BMA) with polymethylphenylsilane (PMPS) as an initiator were measured. Polymethylphenylsilane is photodegrated to form silyl radicals that may initiate polymerizatio