The photoreduction behavior of p-nitroaniline (pNA) in the presence of N,N-dimethylaniline (DMA) induced by both steady-state (365 nm) and laser (337 nm) irradiation has been analyzed. The stoichiometry of the photoreduction reaction revealed that several amino radicals derived from DMA were generat
Photopolymerization and photochemistry of novel photoinitiators based on p-benzoylbenzophenone
✍ Scribed by N.S. Allen; D. Mallon; I. Sideridou; F. Catalina; C. Peinado; A. Timms; A.W. Green
- Publisher
- Elsevier Science
- Year
- 1993
- Tongue
- English
- Weight
- 231 KB
- Volume
- 29
- Category
- Article
- ISSN
- 0014-3057
No coin nor oath required. For personal study only.
✦ Synopsis
Six novel derivatives based on the p-benzoylbenzophenone chromophore have been examined in terms of their photochemical and photoinitiator properties. All the molecules exhibit high extinction coefficients in the u.v. region together with high photoinitiator activity for the polymerization of methyl methacrylate. The 2-substituted methyl and isopropyl derivatives exhibited the lowest activity, consistent with lower phosphorescence quantum yields and ketyl radical formation on microsecond flash photolysis compared with the corresponding 4-substituted derivatives. In the case of 2-substitution with an isopropyl group, ketyl radical formation was not quenched by oxygen indicating that a process of intra-molecular hydrogen atom abstraction predominates. This derivative was also less effective than benzophenone as a photoinitiator. Analysis of the photoproducts in 2-propanol confirmed the involvement of a single step reaction to give a corresponding pinnacol type compound.
📜 SIMILAR VOLUMES
## Abstract **Summary:** By the polycondensation of TDI with DATBP or AATBP, and different coinitiator amines, six novel thio‐containing polymeric photoinitiators that contain a coinitiator amine and a side‐chain or in‐chain benzophenone (PUSBA or PUIBA) have been synthesized. FT‐IR, ^1^H NMR, and
## Abstract Three polymeric photoinitiators, PUSBA‐s, PUSBA‐o and PUSBA‐c, were synthesized through polycondensation of TDI, different photosensitive diamines, and BDEA. UV/Vis spectra indicate that the maximum absorption depends mainly on the structure of the photosensitive groups. ESR spectra sho
A new UV-curable liquid resist based on cationic polymerization of silicone epoxies has been developed for UV-assisted nanoimprint lithography. Uniform films with thicknesses ranging from below 50 nm to over 1 μm can be easily spin-coated using a suitable undercoating layer on a substrate. Patterns
## Abstract Three PU‐type polymeric photoinitiators containing side‐chain benzophenone and coinitiator amine, PUSBA‐h, PUSBA‐t and PUSBA‐i, were synthesized via polycondensation of 3,5‐diamino‐4′‐thiophenylbenzophenone, different diisocyanates and __N__‐methyldiethanolamine. FT‐IR, ^1^H NMR and GPC