Photolysis of bisphenol-based polyurethanes in solution
โ Scribed by Der-Jang Liaw; Shiuh-Ping Lin; Been-Yang Liaw
- Publisher
- John Wiley and Sons
- Year
- 1999
- Tongue
- English
- Weight
- 344 KB
- Volume
- 37
- Category
- Article
- ISSN
- 0887-624X
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โฆ Synopsis
Photolysis of bisphenol-based polyurethanes, using bisphenols A, S, and AF with methylene diphenyl diisocyanate (MDI), has been shown by the observed changes in fluorescence spectra, reduced viscosity, and UV absorbance. Analysis of the fluorescence spectra of model compounds and polymers showed that para-photo-Fries and cleavage-type products were the major components formed during photolysis. The reduced viscosity and UV absorbance changes are consistent with a two-step photodegradation process. The reduced viscosity changes indicate that oxygen inhibition on the cleavage process is more significant for bisphenol S-based polyurethanes than for bisphenol A-and bisphenol AF-based polyurethanes.
๐ SIMILAR VOLUMES
## Abstract Chloranil (2,3,5,6โtetrachloroโ2,5โcyclohexadieneโ1,4โdione; **C**) in deoxygenated acetonitrile shows transient absorptions which are assigned to the radical anion \documentclass{article}\pagestyle{empty}\begin{document}$ \rm {C}^{- \kern-4pt {.}} $\end{document} and to the triplet ^3^