๐”– Bobbio Scriptorium
โœฆ   LIBER   โœฆ

Photoinduced fabrication of complex surface relief structures on azobenzene functionalized polymers

โœ Scribed by J Kumar; L Li; Nirmal K Viswanathan; S Bian; S Balasubramanian; D Y Kim; S K Tripathy

Book ID
110659866
Publisher
Springer-Verlag
Year
1999
Tongue
English
Weight
692 KB
Volume
22
Category
Article
ISSN
0250-4707

No coin nor oath required. For personal study only.

๐Ÿ“œ SIMILAR VOLUMES

Patterning of Substrates Using Surface R
Patterning of Substrates Using Surface Relief Structures on an Azobenzene-Functionalized Polymer Film
โœ S. Yang; K. Yang; L. Niu; R. Nagarajan; S. Bian; A.โ€‰K. Jain; J. Kumar ๐Ÿ“‚ Article ๐Ÿ“… 2004 ๐Ÿ› John Wiley and Sons ๐ŸŒ English โš– 191 KB ๐Ÿ‘ 2 views

**A maskless method for patterning substrates** using surface relief structures on azobenzeneโ€functionalized polymer is demonstrated. Surface relief structures are inscribed on a polymer film spinโ€coated on an indium tin oxide (ITO) substrate by exposure to an interference pattern. Etching with oxyg

UV-Curable Azobenzene Polymer Bearing Ph
UV-Curable Azobenzene Polymer Bearing Photo-Crosslinkable Moiety for Stabilization of Photo-Fabricated Surface Relief Structure
โœ Tatsumi Kimura; Jun.-Young Kim; Takashi Fukuda; Hiro Matsuda ๐Ÿ“‚ Article ๐Ÿ“… 2002 ๐Ÿ› John Wiley and Sons ๐ŸŒ English โš– 174 KB

## Abstract In order to find a new class of photoโ€processable liquid crystalline (LC) aligning material, five kinds of new maleimideโ€based copolymers bearing both azobenzene and cinnamate moieties with different functionalization ratio have been synthesized. The properties of these five copolymers