Photogenerated base in polymer curing and imaging: Design of reactive styrenic copolymers susceptible to a base-catalyzed β-elimination

✍ Scribed by Edward J. Urankar; Jean M. J. Fréchet

• Book ID: 101272040
• Publisher: John Wiley and Sons
• Year: 1997
• Tongue: English
• Weight: 208 KB
• Volume: 35
• Category: Article
• ISSN: 0887-624X
• DOI: 10.1002/(sici)1099-0518(19971130)35:16<3543::aid-pola21>3.0.co;2-e

✦ Synopsis

A novel family of functionalized styrenic copolymers that are susceptible to a base-catalyzed b-elimination reaction is reported. The reactive copolymers, poly-{(2-phenyl-2-cyanoethoxycarbonyloxystyrene)-co-(4-hydroxystyrene)} , are prepared by chemical modification of poly(4-hydroxystyrene) using 2-phenyl-2-cyanoethyl chloroformate. A photoresist material consisting of the copolymer and bis [[(2-nitrobenzyl)oxy]carbonyl]-4,4 -trimethylenedipiperidine used as an amine photogenerator affords positive tone images by UV irradiation. The effect of copolymer structure and composition on imaging, thermal stability, and the ease of b-elimination reaction is discussed.