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Photoemission of Adsorbed Xenon, X-ray Photoelectron Spectroscopy, and Temperature-Programmed Desorption Studies of H 2 O on FeS 2 (100)

โœ Scribed by Guevremont, J. M.; Strongin, D. R.; Schoonen, M. A. A.


Book ID
127134945
Publisher
American Chemical Society
Year
1998
Tongue
English
Weight
278 KB
Volume
14
Category
Article
ISSN
0743-7463

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Dissociative adsorption of monomethylsil
โœ Hideki Nakazawa; Maki Suemitsu ๐Ÿ“‚ Article ๐Ÿ“… 2000 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 163 KB

## ลฝ . Dissociative adsorption of monomethylsilane MMS , a promising precursor gas for low-temperature SiC, has been ลฝ . ลฝ . investigated on Si 100 by using temperature-programmed desorption TPD method after its comparison with Hr and ลฝ . ลฝ . C H rSi 100 surfaces. For both MMSr and C H rSi 100 ,