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Photoelectron spectroscopy (XPS) and photoelectron diffraction (XPD) studies on the system hafnium silicide and hafnium oxide on Si(1 0 0)

✍ Scribed by D. Weier; C. Flüchter; A. de Siervo; M. Schürmann; S. Dreiner; U. Berges; M.F. Carazzolle; A. Pancotti; R. Landers; G.G. Kleiman; C. Westphal

Publisher: Elsevier Science
Year: 2006
Tongue: English
Weight: 473 KB
Volume: 9
Category: Article
ISSN: 1369-8001
DOI: 10.1016/j.mssp.2006.10.023

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Photoelectron spectroscopy (XPS) and photoelectron diffraction (XPD) studies on the system hafnium silicide and hafnium oxide on Si(1&#xa0;0&#xa0;0)

Photoelectron spectroscopy (XPS) and photoelectron diffraction (XPD) studies on the system hafnium silicide and hafnium oxide on Si(1 0 0)