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Photoelectrochemical etching of polycrystalline TiO2 thin film electrodes

โœ Scribed by Hilmar Vidarsson; Maja Elmgren; Sten-Eric Lindquist


Publisher
Elsevier Science
Year
1988
Weight
569 KB
Volume
255
Category
Article
ISSN
0022-0728

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๐Ÿ“œ SIMILAR VOLUMES


Local film thickness and photoresponse o
โœ M. Kozlowski; W.H. Smyrl; Lj. Atanasoska; R. Atanasoski ๐Ÿ“‚ Article ๐Ÿ“… 1989 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 1009 KB

Auger depth profiling was used to determine the local film thickness of a thin anodic oxide grown on a polycrystalline Ti substrate. The oxide thickness was studied as a function of substrate crystallography and final growth voltage. These results were related to local photocurrent measurements obta