๐”– Bobbio Scriptorium
โœฆ   LIBER   โœฆ

Photochemistry of N2O on Si(100): surface photo-oxidation

โœ Scribed by Hiroyuki Kato; Jihwa Lee; Kyoichi Sawabe; Yoshiyasu Matsumoto


Book ID
117220167
Publisher
Elsevier Science
Year
2000
Tongue
English
Weight
494 KB
Volume
445
Category
Article
ISSN
0039-6028

No coin nor oath required. For personal study only.


๐Ÿ“œ SIMILAR VOLUMES


Rapid thermal N2O oxynitride on Si(100)
โœ Lu, Z. H. ๐Ÿ“‚ Article ๐Ÿ“… 1996 ๐Ÿ› AVS (American Vacuum Society) ๐ŸŒ English โš– 353 KB
Angular distributions of N2 in the photo
โœ Jihwa Lee; Hiroyuki Kato; Kyoichi Sawabe; Yoshiyasu Matsumoto ๐Ÿ“‚ Article ๐Ÿ“… 1995 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 596 KB

The time-of-flight distributions of the N, photofragment produced in the UV photodissociation of N,O adsorbed on a partially oxidized Si(100) surface at 95 K have been measured as a function of the desorption angle. Photoinduced electron transfer initiates the dissociation of N,O to produce an adsor