Angular distributions of N2 in the photodissociation of N2O adsorbed on a partially oxidized Si(100) surface at 95 K

✍ Scribed by Jihwa Lee; Hiroyuki Kato; Kyoichi Sawabe; Yoshiyasu Matsumoto

• Publisher: Elsevier Science
• Year: 1995
• Tongue: English
• Weight: 596 KB
• Volume: 240
• Category: Article
• ISSN: 0009-2614
• DOI: 10.1016/0009-2614(95)00566-m

✦ Synopsis

The time-of-flight distributions of the N, photofragment produced in the UV photodissociation of N,O adsorbed on a partially oxidized Si(100) surface at 95 K have been measured as a function of the desorption angle. Photoinduced electron transfer initiates the dissociation of N,O to produce an adsorbed oxygen atom and energetic N, desorbing from the surface. Interestingly, the angular distribution of N, originating from chemisorbed N,O molecules is peaked at = 32" from the surface normal. The results are discussed on the basis of bonding geometry and photodissociation dynamics of N,O.