𝔖 Bobbio Scriptorium
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Phase grating: Analytical formulas for the near field

✍ Scribed by Victor Arrizón; J. Ojeda-Castañeda


Book ID
112145849
Publisher
John Wiley and Sons
Year
1992
Tongue
English
Weight
314 KB
Volume
5
Category
Article
ISSN
0895-2477

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Electron beam lithography of phase mask
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This paper reports on processing methods used to produce phase masks for near field holographic writing of fibre gratings. The masks are produced using e-beam lithography (EBL) and reactive ion etching (RIE). We shall discuss the relations between grating parameters such as ridge duty cycle and groo