Cost-effective fabrication of a phase ma
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Ying-Tsung Lu; Yung-Hsin Chen; Sien Chi
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Article
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2003
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John Wiley and Sons
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English
β 176 KB
## Abstract A simple and costβeffective method to manufacture a phase mask with high diffraction efficiency for deep UV application is proposed. The deep rectangular grating fabricated by using laser interference is etched directly into a fused silica substrate, instead of the dielectric coating on