Cost-effective fabrication of a phase mask by direct etching of the laser-interference grating on fused silica substrate
✍ Scribed by Ying-Tsung Lu; Yung-Hsin Chen; Sien Chi
- Publisher
- John Wiley and Sons
- Year
- 2003
- Tongue
- English
- Weight
- 176 KB
- Volume
- 38
- Category
- Article
- ISSN
- 0895-2477
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✦ Synopsis
Abstract
A simple and cost‐effective method to manufacture a phase mask with high diffraction efficiency for deep UV application is proposed. The deep rectangular grating fabricated by using laser interference is etched directly into a fused silica substrate, instead of the dielectric coating on a substrate (done in a previous method). Using the metal layer on a dielectric layer for masking in the deep, dry etching process is also unnecessary in our technique. A fabricated rectangular grating with high diffraction efficiency is presented in this paper. We also demonstrate the fabrication processes and show the optimum parameters for our proposed technology. © 2003 Wiley Periodicals, Inc. Microwave Opt Technol Lett 38: 362–365, 2003; Published online in Wiley InterScience (www.interscience.wiley.com). DOI 10.1002/mop.11061