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Periodates of Tetravalent Titanium, Zirconium, Hafnium and Thorium: Synthesis, Characterisation and EXAFS Study

โœ Scribed by Andrew L. Hector; William Levason


Publisher
John Wiley and Sons
Year
2005
Tongue
English
Weight
128 KB
Volume
2005
Category
Article
ISSN
1434-1948

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Chemical vapour deposition of the oxides
โœ Ryan C. Smith; Tiezhong Ma; Noel Hoilien; Lancy Y. Tsung; Malcolm J. Bevan; Luig ๐Ÿ“‚ Article ๐Ÿ“… 2000 ๐Ÿ› John Wiley and Sons ๐ŸŒ English โš– 340 KB ๐Ÿ‘ 3 views

A brief survey of the precursors used for the chemical vapour deposition of the dioxides of titanium, zirconium and hafnium is presented. The review covers precursors used for the closely related process known as atomic layer chemical vapour deposition (ALCVD or ALD). Precursors delivered by standar