We have manufactured thallium-doped cesium iodide (CsI:Tl) scintillator thin films by the thermal deposition method. The scintillation characteristics of the CsI:Tl thin films were studied by X-rayinduced luminescence for different Tl doping concentrations between 0.05 and 1.0 mol%. The wavelength o
Performance studies of a monolithic scintillator-CMOS image sensor for X-ray application
β Scribed by Bo Kyung Cha; Jun Hyung Bae; Byoung-Jik Kim; Hosang Jeon; Gyuseong Cho
- Publisher
- Elsevier Science
- Year
- 2008
- Tongue
- English
- Weight
- 596 KB
- Volume
- 591
- Category
- Article
- ISSN
- 0168-9002
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β¦ Synopsis
We proposed the direct deposition of CsI(Tl) scintillator layer with pixelated structure on a CMOS image sensor (CIS) in order to improve the spatial resolution. CMOS sensors developed for test have a 128 Γ 128 photodiode array with 50 mm pixel pitch and integrated readout-electronics including a 10 bit pipe-lined ADC. CsI(Tl) layer has thickness of 50 mm. The modulation transfer function, the noise power spectrum, and the detective quantum efficiency of pixelated and non-pixelated CsI(Tl) X-ray image sensors (XIS) were estimated with a 50 kVp X-ray beam. At 10% of modulation transfer function (MTF), the spatial resolution of pixelated and nonpixleated XIS are about 8 and 6 lp/mm, respectively. It implies that pixelation enhances the spatial resolution by reducing the lateral light diffusion. Though the NPS of pixelated XIS was slightly higher than the non-pixelated XIS, its detective quantum efficiency (DQE) values were much better than non-pixelated XIS especially at high spatial frequencies.
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