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Performance of 2 nm gate length carbon nanotube field-effect transistors with source∕drain underlaps

✍ Scribed by Alam, Khairul; Lake, Roger


Book ID
121010540
Publisher
American Institute of Physics
Year
2005
Tongue
English
Weight
461 KB
Volume
87
Category
Article
ISSN
0003-6951

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A semianalytical carbon nanotube field-effect transistor (CNFET) model based on the virtual-source model is presented, which includes series resistance, parasitic capacitance, and direct source-to-drain tunneling leakage. The model is calibrated with recent experimental data down to 9-nm gate length