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Perfluoropropylene oxide as a reagent for the synthesis of germanium, titanium, tin, and zirconium fluorides

โœ Scribed by S. A. Lermontov; A. N. Malkova; E. Kh. Lermontova; A. V. Churakov


Book ID
111460701
Publisher
Springer
Year
2010
Tongue
English
Weight
249 KB
Volume
80
Category
Article
ISSN
1070-3632

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Chemical vapour deposition of the oxides
โœ Ryan C. Smith; Tiezhong Ma; Noel Hoilien; Lancy Y. Tsung; Malcolm J. Bevan; Luig ๐Ÿ“‚ Article ๐Ÿ“… 2000 ๐Ÿ› John Wiley and Sons ๐ŸŒ English โš– 340 KB ๐Ÿ‘ 3 views

A brief survey of the precursors used for the chemical vapour deposition of the dioxides of titanium, zirconium and hafnium is presented. The review covers precursors used for the closely related process known as atomic layer chemical vapour deposition (ALCVD or ALD). Precursors delivered by standar