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Peening in ion-assisted thin-film deposition: a generalized model

✍ Scribed by Carter, G


Book ID
126763539
Publisher
Institute of Physics
Year
1994
Tongue
English
Weight
837 KB
Volume
27
Category
Article
ISSN
0022-3727

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## Abstract This work reports on the fabrication and characterization of indium oxide semiconducting films and their application in thin‐film transistors (TFTs). The films have been deposited at room temperature by oxygen ion beam assisted e‐beam evaporation. The influence of deposition conditions