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PEELS and EXELFS characterization of diamond films grown by the HF-CVD technique on non-scratched Si substrates

✍ Scribed by A. Duarte-Moller; O. Contreras; G.A. Hirata; M. Avalos-Borja; D.H. Galván; L. Morales de la Garza; L. Cota-Araiza

No coin nor oath required. For personal study only.

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