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PECVD films for low-temperature poly-Si TFT-LCD applications

โœ Scribed by T. Takehara; W. R. Harshbarger; C. C. Tsai; D. Toet; T. Sigmon


Book ID
119924079
Publisher
Society for Information Display
Year
2001
Tongue
English
Weight
372 KB
Volume
9
Category
Article
ISSN
1071-0922

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Low temperature poly-Si TFTs for display
โœ In-Hyuk Song; Min-Koo Han ๐Ÿ“‚ Article ๐Ÿ“… 2003 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 240 KB

We have fabricated new polycrystalline silicon (poly-Si) thin film transistors (TFTs) with a single grain-boundary by a simple excimer laser annealing (ELA) method which employs a selectively floating amorphous silicon (a-Si) active layer and Al patterns. A thermally insulating air-gap between the f