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Peculiarities of the reflection spectra of PECVD nanocrystalline porous silicon films

✍ Scribed by V. A. Vikulov; A. M. Maslov; A. A. Dimitriev; V. V. Korobtsov


Book ID
110175578
Publisher
SP MAIK Nauka/Interperiodica
Year
2007
Tongue
English
Weight
266 KB
Volume
103
Category
Article
ISSN
0030-400X

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## Abstract Boron‐doped nanocrystalline silicon (nc‐Si:H) films were deposited by plasma‐enhanced chemical vapor deposition (PECVD). A variety of techniques, including X‐ray diffraction (XRD), Raman scattering (RS), UV–Vis–NIR spectroscopy and conductivity measurement were used to characterize the