Patterning of 0.1 μm polysilicon lines by using a negative electron beam resist

✍ Scribed by J. Barrier; J.P. Miéville; M. Dutoit; Y. Oppliger; J.M. Moret; A. Perret

• Book ID: 107920425
• Publisher: Elsevier Science
• Year: 1990
• Tongue: English
• Weight: 356 KB
• Volume: 11
• Category: Article
• ISSN: 0167-9317
• DOI: 10.1016/0167-9317(90)90086-9