Pattern-Transfer Fidelity in Soft Lithography: The Role of Pattern Density and Aspect Ratio

✍ Scribed by T.-W. Lee; O. Mitrofanov; J. W. P. Hsu

• Publisher: John Wiley and Sons
• Year: 2005
• Tongue: English
• Weight: 407 KB
• Volume: 15
• Category: Article
• ISSN: 1616-301X
• DOI: 10.1002/adfm.200400295

✦ Synopsis

Abstract

Using high‐aspect‐ratio nanostructures fabricated via two‐photon laser‐scanning lithography, we examine the deformation of elastomeric stamps used in soft nanolithography and the fidelity of patterns and replicas made using these stamps. Two‐photon laser‐scanning lithography enables us to systematically regulate the aspect ratio and pattern density of the nanostructures by varying laser‐scanning parameters such as the intensity of the laser beam, the scanning speed, the focal depth inside the resist, and the scanning‐line spacing. Two commercially available stamp/mold materials with different moduli have been investigated. We find that the pattern‐transfer fidelity is strongly affected by the pattern density. In addition, we demonstrate that true three‐dimensional structures can be successfully replicated because of the flexible nature of elastomeric poly(dimethylsiloxane).