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Nanoimprint Lithography and the Role of Viscoelasticity in the Generation of Residual Stress in Model Polystyrene Patterns

✍ Scribed by Yifu Ding; Hyun Wook Ro; Kyle J. Alvine; Brian C. Okerberg; Jing Zhou; Jack F. Douglas; Alamgir Karim; Christopher L. Soles

Publisher
John Wiley and Sons
Year
2008
Tongue
English
Weight
206 KB
Volume
18
Category
Article
ISSN
1616-301X

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