Paramagnetic intrinsic point defects in nm-sized silica particles: Interaction with SiO at elevated temperatures

Point defect generation in SiO2 by inter

Point defect generation in SiO2 by interaction with SiO at elevated temperatures

✍ A. Stesmans; V.V. Afanas'ev 📂 Article 📅 1997 🏛 Elsevier Science 🌐 English ⚖ 302 KB

The interaction of fused silica (SiO2) with gaseous SiO during annealing at ~1140 °C has been studied by electron spin resonance (ESR). In contrast with annealing in vacuum, this results in the generation of an isotropic defect in SiO2 of g=2.0028 and peak-to-peak width 3.6-6 G. These spectroscopic