Oxygen effect on characteristics of a PGMA resist

✍ Scribed by Yoshio Taniguchi; Tadao Kaneko; Toshio Nakano; Michiaki Hashimoto; Akira Sasano; Ken Tsutsui; Kiyotake Naraoka

• Publisher: John Wiley and Sons
• Year: 1982
• Tongue: English
• Weight: 176 KB
• Volume: 27
• Category: Article
• ISSN: 0021-8995
• DOI: 10.1002/app.1982.070270327

✦ Synopsis

Oxygen Effect on Characteristics of a PGMA Resist

Poly(glycidy1 methacrylate) (PGMA), used as an electron beam resist,1f2 has also been used as a deep UV resist. It has previously been reported2 that PGMA shows a negative-working characteristic to electron beam exposure and that crosslinking of PGMA polymers continues to some extent in a vacuum even after electron exposure is stopped (the so-called vacuum curing). PGMA can also crosslink by baking. On the other hand, it shows a positive working characteristic to deep UV light.

It was recently found that the characteristics of PGMA polymers are influenced by oxygen during deep UV irradiation or baking. This paper describes the effects of oxygen on the characteristics of a PGMA resist.