Oxygen depth profiling study of copper oxide films on silicon (100) substrates by 16O(α,α)16O resonance

✍ Scribed by Li Jian; L.J. Matienzo; P. Revesz; Gy. Vizkelethy; S.Q. Wang; J.J. Kaufman; J.W. Mayer

• Book ID: 113281125
• Publisher: Elsevier Science
• Year: 1990
• Tongue: English
• Weight: 405 KB
• Volume: 46
• Category: Article
• ISSN: 0168-583X
• DOI: 10.1016/0168-583x(90)90714-6