Oxygen Atom Abstraction of Hydrogen Chemisorbed on a Silicon Surface
β Scribed by Ree, J.; Kim, Y. H.; Shin, H. K.
- Book ID
- 126126707
- Publisher
- American Chemical Society
- Year
- 2003
- Tongue
- English
- Weight
- 276 KB
- Volume
- 107
- Category
- Article
- ISSN
- 1089-5639
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π SIMILAR VOLUMES
Classical trajectory studies have been carried out for the reaction of gas phase atomic O with H atoms chemisorbed on a corrugated tungsten surface. Most reactive events are found to occur in single-impact collisions on a subpicosecond scale via the Eley-Rideal mechanism producing highly excited OH.
The initial stage of oxidation of anodized porous silicon (PS) at low temperature (\lesssim208Β°C) has been investigated using a conventional infrared (IR) spectroscopy technique. After the oxidation in air, four extra IR absorption peaks appeared in the Si-H stretching band (2000βΌ2300 cm-1). The ori