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Oxide barriers to the formation of refractory silicides

✍ Scribed by D.J. Silversmith; D.D. Rathman; R.W. Mountain


Publisher
Elsevier Science
Year
1982
Tongue
English
Weight
376 KB
Volume
93
Category
Article
ISSN
0040-6090

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πŸ“œ SIMILAR VOLUMES


Formation kinetics and composition of ti
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Ahstrati-The kinetics of the low temperature anodic oxidation of titanium silicide in KNO, solutions in ethylene glycol has been investigated as a function of the anodization current density. A strong influence of the anodic current density in the oxide composition, as determined by Rutherford backs

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## Abstract **Experimental Factors Affecting Oxide Growth** Results of galvanostatic anodization of various metals with varying valve‐metal behaviour including Nb, Ta, Zr, Ti, Al, W, Te, Sb, and Bi are compiled and compared with respect to the effect of various experimental factors such as surface